Nature Nanotechnology
Nature Nanotechnology
a year ago

Sensitive photoresists for high-speed two­-photon lithography

Sensitive photoresists for high-speed two­-photon lithography
Two-photon lithography has advantages for precise additive manufacturing at the nanoscale, but its printing speed is currently too slow for large-scale practical applications. A sensitive photoresist based on zirconium oxide hybrid nanoparticles is shown to increase the linear printing speed of two-­photon lithography up to the order of metres per second.

Publisher URL: https://www.nature.com/articles/s41565-023-01518-9

DOI: 10.1038/s41565-023-01518-9

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